Invention Grant
- Patent Title: Method for forming a reflection-type light diffuser
- Patent Title (中): 形成反射型光扩散器的方法
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Application No.: US10248809Application Date: 2003-02-21
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Publication No.: US06986983B2Publication Date: 2006-01-17
- Inventor: Chung-Kuang Wei , Cheng-Jen Chu , Chia-Liang Lin
- Applicant: Chung-Kuang Wei , Cheng-Jen Chu , Chia-Liang Lin
- Applicant Address: TW Tainan
- Assignee: Chi Mei Optoelectronics Corporation
- Current Assignee: Chi Mei Optoelectronics Corporation
- Current Assignee Address: TW Tainan
- Agent Winston Hsu
- Priority: TW91103698A 20020227
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/40

Abstract:
A reflection-type light diffuser is fabricated on a glass substrate, which has a pixel matrix array disposed thereon. The pixel matrix array includes a plurality of adjacent pixel regions, and each of the pixel regions has a pair of side edges that are parallel and opposite. A photoresist pattern is formed on the glass substrate, and the photoresist pattern includes a plurality of wave-shaped straight protrusions formed on the side edges of each of the pixel regions and a plurality of bump structures formed on each of the pixel regions. A reflective metal layer is formed on the photoresist pattern.
Public/Granted literature
- US20030161940A1 METHOD FOR FORMING A REFLECTION-TYPE LIGHT DIFFUSER Public/Granted day:2003-08-28
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