Invention Grant
- Patent Title: Method for fabricating floating gate
- Patent Title (中): 浮栅制造方法
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Application No.: US10442308Application Date: 2003-05-19
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Publication No.: US06921694B2Publication Date: 2005-07-26
- Inventor: Ying-Cheng Chuang , Chung-Lin Huang , Chi-Hui Lin
- Applicant: Ying-Cheng Chuang , Chung-Lin Huang , Chi-Hui Lin
- Applicant Address: TW Taoyuan
- Assignee: Nanya Technology Corporation
- Current Assignee: Nanya Technology Corporation
- Current Assignee Address: TW Taoyuan
- Agency: Ladas & Parry LLP
- Priority: TW91113597A 20020621
- Main IPC: H01L21/28
- IPC: H01L21/28 ; H01L29/423 ; H01L21/336

Abstract:
A method for fabricating a floating gate with multiple tips. A semiconductor substrate is provided, on which an insulating layer and a patterned hard mask layer are sequentially formed. The patterned hard mask layer has an opening to expose the surface of the semiconductor substrate. A conducting layer is conformally formed on the patterned hard mask layer, and the opening is filled with the conducting layer. The conducting layer is planarized to expose the surface of the patterned hard mask layer. The conducting layer is thermally oxidized to form an oxide layer, and the patterned hard mask layer is removed.
Public/Granted literature
- US20030235954A1 Method for fabricating floating gate Public/Granted day:2003-12-25
Information query
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