发明授权
- 专利标题: Shock wave reflector and detonation chamber
- 专利标题(中): 冲击波反射器和爆轰室
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申请号: US10107653申请日: 2002-03-27
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公开(公告)号: US06877310B2公开(公告)日: 2005-04-12
- 发明人: Ivett Alejandra Leyva
- 申请人: Ivett Alejandra Leyva
- 申请人地址: US NY Niskayuna
- 专利权人: General Electric Company
- 当前专利权人: General Electric Company
- 当前专利权人地址: US NY Niskayuna
- 代理商 Richard A. DeCristofaro; Patrick K. Patnode
- 主分类号: F02K7/02
- IPC分类号: F02K7/02 ; F02K7/04 ; F23R7/00 ; F02C5/00
摘要:
A shock wave reflector includes a number of reflective units positioned along a longitudinal direction and separated by a gap G. Each reflective unit has a length L. The length L and the gap G are governed by a relationship L+G≧λ. The variable λ characterizes a cell size for a detonation mixture. A detonation chamber includes a receiving end, a discharge end, and a wall extending along a longitudinal direction between the receiving and discharge ends. The detonation chamber further includes a number of reflective units formed in the wall and positioned along the longitudinal direction. The reflective units are separated by a gap G, and each reflective unit has a length L.
公开/授权文献
- US20030182927A1 Shock wave reflector and detonation chamber 公开/授权日:2003-10-02
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