发明授权
- 专利标题: Thin-film opto-electronic device and a method of making it
- 专利标题(中): 薄膜光电器件及其制作方法
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申请号: US10644690申请日: 2003-08-19
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公开(公告)号: US06815247B2公开(公告)日: 2004-11-09
- 发明人: Lieven Stalmans , Jef Poortmans , Matty Caymax , Khalid Said , Johan Nijs
- 申请人: Lieven Stalmans , Jef Poortmans , Matty Caymax , Khalid Said , Johan Nijs
- 优先权: EP98870147 19980703
- 主分类号: H01L2100
- IPC分类号: H01L2100
摘要:
A thin-film opto-electronic device on a conductive silicon-containing substrate includes a sequence of layers. The layers include a layer of a porous medium preferably a porous silicon, on a substrate. The porous layer has both light diffusing and light reflecting properties. In addition, a non-porous layer is located on said porous silicon layer, with at least one first region and at least one second region being in said non-porous layer. The first region is of a first conductivity type acting as a light absorber and the second region has a conductivity of a second type, different from said first conductivity type. The sequence of layers is such that optical confinement is realised in the device.
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