发明授权
- 专利标题： Suspended high reflectivity coating on release structure and fabrication process therefor
- 专利标题（中）： 悬浮高反射率涂层在释放结构及其制造工艺上
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申请号： US09851510申请日： 2001-05-08
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公开(公告)号： US06808276B2公开(公告)日： 2004-10-26
- 发明人: Walid A. Atia , Minh Van Le
- 申请人： Walid A. Atia , Minh Van Le
- 主分类号： G02B7182
- IPC分类号： G02B7182
摘要：
In a MOEMS device and corresponding fabrication process, absorbing material along the optical axis of the device is removed. The result is a suspended optical coating, such as a dielectric thin film mirror stack. Such optical coatings can have very low absorption. Thus, the invention can materially lower the net absorption in the device, and thereby improve performance, by degrading power related dependencies.
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