发明授权
US06794111B2 Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation
有权
聚合物，抗蚀剂组合物和图案化工艺，新型四氢呋喃化合物及其制备
- 专利标题： Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation
- 专利标题（中）： 聚合物，抗蚀剂组合物和图案化工艺，新型四氢呋喃化合物及其制备
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申请号： US10126877申请日： 2002-04-22
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公开(公告)号： US06794111B2公开(公告)日： 2004-09-21
- 发明人: Tsunehiro Nishi , Takeshi Kinsho , Seiichiro Tachibana , Takeru Watanabe , Koji Hasegawa , Tomohiro Kobayashi
- 申请人： Tsunehiro Nishi , Takeshi Kinsho , Seiichiro Tachibana , Takeru Watanabe , Koji Hasegawa , Tomohiro Kobayashi
- 优先权： JP2001-124126 20010423; JP2001-124137 20010423
- 主分类号： G03C1492
- IPC分类号： G03C1492
摘要：
A polymer comprising recurring units of formula (1-1) or (1-2) wherein R1, R2, R3 and R4 are H or alkyl, or R1 and R2, and R3 and R4 taken together may form a ring with each pair being alkylene, and k is 0 or 1 and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.
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