A method of manufacturing an integrated circuit is provided having a semiconductor wafer. A chemical-mechanical polishing stop layer is deposited on the semiconductor wafer and a first photoresist layer is processed over the chemical-mechanical polishing stop layer. The chemical-mechanical polishing stop layer and the semiconductor wafer are patterned to form a shallow trench and a shallow trench isolation material is deposited on the chemical-mechanical polishing stop layer and in the shallow trench. A second photoresist layer is processed over the shallow trench isolation material leaving the shallow trench uncovered. The uncovered shallow trench is then treated to become a chemical-mechanical polishing stop area. The shallow trench isolation material is then chemical-mechanical polished to be co-planar with the chemical-mechanical stop layer and the chemical-mechanical polishing stop treated area.