发明授权
- 专利标题: X-ray reflectance measurement system with adjustable resolution
- 专利标题(中): 具有可调分辨率的X射线反射测量系统
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申请号: US10053373申请日: 2001-10-24
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公开(公告)号: US06744850B2公开(公告)日: 2004-06-01
- 发明人: Jeffrey T. Fanton , Craig Uhrich , Louis N. Koppel
- 申请人: Jeffrey T. Fanton , Craig Uhrich , Louis N. Koppel
- 主分类号: G01T136
- IPC分类号: G01T136
摘要:
An x-ray reflectometry system for measuring thin film samples. The system includes an adjustable x-ray source, such that characteristics of an x-ray probe beam output by the x-ray source can be adjusted to improve the resolution of the measurement system. The x-ray probe beam can also be modified to increase the speed of evaluating the thin film sample, for situations where some degree of resolution can be sacrificed. In addition, or alternatively, the system can also provide an adjustable detector position device which allows the position of the detector to be adjusted to increase the resolution of the system, or to reduce the time it takes to evaluate the thin film material.
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