发明授权
- 专利标题: Method of manufacturing an electro-optical device
- 专利标题(中): 电光装置的制造方法
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申请号: US10236957申请日: 2002-09-09
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公开(公告)号: US06743650B2公开(公告)日: 2004-06-01
- 发明人: Yoshiharu Hirakata , Takeshi Nishi , Shunpei Yamazaki
- 申请人: Yoshiharu Hirakata , Takeshi Nishi , Shunpei Yamazaki
- 优先权: JP9-148540 19970522; JP9-152805 19970526; JP9-167990 19970609; JP9-183024 19970623
- 主分类号: H01L2100
- IPC分类号: H01L2100
摘要:
In an active matrix semiconductor display device in which pixel TFTs and driver circuit TFT are formed on the same substrate in an integral manner, the cell gap is controlled by gap retaining members that are disposed between a pixel area and driver circuit areas. This makes it possible to provide a uniform cell thickness profile over the entire semiconductor display device. Further, since conventional grainy spacers are not used, stress is not imposed on the driver circuit TFTs when a TFT substrate and an opposed substrate are bonded together. This prevents the driver circuit TFTs from being damaged.
公开/授权文献
- US20030017634A1 Electro-optical device 公开/授权日:2003-01-23
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