发明授权
- 专利标题: Preparation of diorganodichlorosilane
- 专利标题(中): 二有机二氯硅烷的制备
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申请号: US10218558申请日: 2002-08-15
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公开(公告)号: US06632956B2公开(公告)日: 2003-10-14
- 发明人: Akihito Tsukuno , Hiroyuki Kobayashi , Yukinori Satoh , Hideaki Ozeki , Yoshihiro Shirota , Susumu Ueno
- 申请人: Akihito Tsukuno , Hiroyuki Kobayashi , Yukinori Satoh , Hideaki Ozeki , Yoshihiro Shirota , Susumu Ueno
- 优先权: JP2001-247800 20010817
- 主分类号: C07F704
- IPC分类号: C07F704
摘要:
A diorganodichlorosilane is prepared by subjecting organochlorosilanes to disproportionation reaction in the co-presence of a SiH group-containing compound and in the presence of a primary catalyst of AlCl3 or AlBr3 and a co-catalyst of Mg, Al, Ca, Ti, Fe, Ni, Cu, Zn or Sn or a compound thereof. The invention enables disproportionation reaction of organochlorosilanes under atmospheric pressure and at a low temperature at which no substantial sublimation of AlCl3 or the like occurs, thus allowing the reaction equipment to be simple and improving the safety of reaction.
公开/授权文献
- US20030109735A1 Preparation of diorganodichlorosilane 公开/授权日:2003-06-12
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