发明授权
US06511785B1 Chemically amplified positive resist composition and patterning method 有权
化学扩增阳性抗蚀剂组合物和图案化方法

Chemically amplified positive resist composition and patterning method
摘要:
A chemically amplified positive resist composition comprising a base resin and a compound containing two to six functional groups, specifically alkenyloxy, acetal and ortho-ester groups in the molecule is suitable for forming a contact hole pattern by the thermal flow process.
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