发明授权
US06511785B1 Chemically amplified positive resist composition and patterning method
有权
化学扩增阳性抗蚀剂组合物和图案化方法
- 专利标题： Chemically amplified positive resist composition and patterning method
- 专利标题（中）： 化学扩增阳性抗蚀剂组合物和图案化方法
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申请号： US09709629申请日： 2000-11-13
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公开(公告)号： US06511785B1公开(公告)日： 2003-01-28
- 发明人: Katsuya Takemura , Kenji Koizumi , Tatsushi Kaneko , Toyohisa Sakurada
- 申请人： Katsuya Takemura , Kenji Koizumi , Tatsushi Kaneko , Toyohisa Sakurada
- 优先权： JP11-323332 19991112
- 主分类号： G03C173
- IPC分类号： G03C173
摘要：
A chemically amplified positive resist composition comprising a base resin and a compound containing two to six functional groups, specifically alkenyloxy, acetal and ortho-ester groups in the molecule is suitable for forming a contact hole pattern by the thermal flow process.
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