Invention Grant
- Patent Title: Atomic force microscope for profiling high aspect ratio samples
- Patent Title (中): 原子力显微镜用于分析高纵横比样品
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Application No.: US09410123Application Date: 1999-09-30
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Publication No.: US06489611B1Publication Date: 2002-12-03
- Inventor: Bernardo D. Aumond , Kamal Youcef-Toumi
- Applicant: Bernardo D. Aumond , Kamal Youcef-Toumi
- Main IPC: G01N1316
- IPC: G01N1316

Abstract:
Apparatus and methods are provided for using atomic force microscopy for profiling high aspect ratio features. Probe landing techniques include scanning prior to bringing the probe into contact with the feature. In one embodiment, the probe assembly cantilever is brought into contact with the feature and subsequent scanning is used to locate the feature with the probe. In another embodiment, the probe is moved in a scanning pattern in progressively lower horizontal planes until the probe contacts the sample feature. Also described is a deconvolution technique for deconvolving the sample image and a technique for measuring the tip radius of the feature.
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