Invention Grant
- Patent Title: CMOS image sensor and method for fabricating the same
- Patent Title (中): CMOS图像传感器及其制造方法
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Application No.: US09947690Application Date: 2001-09-06
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Publication No.: US06459131B1Publication Date: 2002-10-01
- Inventor: Kyung-Lak Lee
- Applicant: Kyung-Lak Lee
- Priority: KR2000-58165 20001004
- Main IPC: H01L310232
- IPC: H01L310232

Abstract:
A CMOS image sensor for preventing a formation of scum and overlaps of neighboring color filters is provided. The image sensor includes: a semiconductor structure; a first color filter formed on the semiconductor structure, wherein the first color filter includes a first stacked layer, the first stacked layer having a first nitride layer and a first oxide layer; a second color filter, wherein the second color filter is formed with a dyed photoresist and in contact with the first color filter; and a third color filter formed on a portion where is not overlapped with the first and the second color filter, wherein the third color filter includes a second stacked layer, the second stacked layer having a second nitride layer and a second oxide layer.
Public/Granted literature
- US20020043661A1 CMOS IMAGE SENSOR AND METHOD FOR FABRICATING THE SAME Public/Granted day:2002-04-18
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