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US06459131B1 CMOS image sensor and method for fabricating the same 失效
CMOS图像传感器及其制造方法

  • Patent Title: CMOS image sensor and method for fabricating the same
  • Patent Title (中): CMOS图像传感器及其制造方法
  • Application No.: US09947690
    Application Date: 2001-09-06
  • Publication No.: US06459131B1
    Publication Date: 2002-10-01
  • Inventor: Kyung-Lak Lee
  • Applicant: Kyung-Lak Lee
  • Priority: KR2000-58165 20001004
  • Main IPC: H01L310232
  • IPC: H01L310232
CMOS image sensor and method for fabricating the same
Abstract:
A CMOS image sensor for preventing a formation of scum and overlaps of neighboring color filters is provided. The image sensor includes: a semiconductor structure; a first color filter formed on the semiconductor structure, wherein the first color filter includes a first stacked layer, the first stacked layer having a first nitride layer and a first oxide layer; a second color filter, wherein the second color filter is formed with a dyed photoresist and in contact with the first color filter; and a third color filter formed on a portion where is not overlapped with the first and the second color filter, wherein the third color filter includes a second stacked layer, the second stacked layer having a second nitride layer and a second oxide layer.
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