发明授权
- 专利标题: Method of filling an embroidery stitch pattern with satin stitches having a constant interstitch spacing
- 专利标题(中): 用具有恒定间隔间距的缎纹针迹填充刺绣针迹图案的方法
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申请号: US09079011申请日: 1998-05-14
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公开(公告)号: US06390005B1公开(公告)日: 2002-05-21
- 发明人: Benito Chia , Brian Goldberg , Niranjan Mayya , Anastasios Tsonis
- 申请人: Benito Chia , Brian Goldberg , Niranjan Mayya , Anastasios Tsonis
- 主分类号: D05B9700
- IPC分类号: D05B9700
摘要:
A method of filling a defined embroidery pattern shape, with the shape comprising a curve defining the shape, fills the pattern shape with a plurality of turning satin-like embroidery stitches which turn to follow the defined shape. In carrying out the method, the density inset for the next adjacent satin-like embroidery stitch is dynamically varied in accordance with any change in the defined shape from the previous stitch, taking into account the stitch length and stitch angle. The process is iteratively repeated , using the predefined perpendicular distance from the previous stitch end point to the new stitch end point until the defined shape is completely filled.
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