发明授权
- 专利标题： Self-trapping and self-focusing of optical beams in photopolymers
- 专利标题（中）： 光束在光聚合物中的自陷和自聚焦
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申请号： US09443035申请日： 1999-11-18
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公开(公告)号： US06387593B1公开(公告)日： 2002-05-14
- 发明人: Anthony S. Kewitsch , Amnon Yariv
- 申请人： Anthony S. Kewitsch , Amnon Yariv
- 优先权： WOPCT/US96/10151 19960611
- 主分类号： G03C500
- IPC分类号： G03C500
摘要：
A polymer material is exposed to radiation of a type that changes some aspect of the polymer's radiation passing properties. The radiation that caused the property change is then contained by the material. The property change can be self-focusing or self-trapping light can be used. In that case, the same light that causes the photopolymerization is contained by the change in index of refraction that is caused by the polymerization.
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