发明授权
- 专利标题： Photoresist monomers and preparation thereof
- 专利标题（中）： 光致抗蚀剂单体及其制备方法
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申请号： US09428171申请日： 1999-10-27
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公开(公告)号： US06359153B1公开(公告)日： 2002-03-19
- 发明人: Geun Su Lee , Chang Il Choi , Hyeong Soo Kim , Jin Soo Kim , Jae Chang Jung , Min Ho Jung , Ki Ho Baik
- 申请人： Geun Su Lee , Chang Il Choi , Hyeong Soo Kim , Jin Soo Kim , Jae Chang Jung , Min Ho Jung , Ki Ho Baik
- 优先权： KR98/45599 19981028; KR98-49022 19981116
- 主分类号： C07D30700
- IPC分类号： C07D30700
摘要：
The present invention relates to monomers for preparing photoresist polymer resins which can be used in a photolithography process employing a deep ultraviolet light source, and the preparation of the same. Preferred monomers are represented by following Chemical Formula 1: wherein, X represents CH2, CH2CH2, or oxygen; R1 represents hydrogen, C1-C5 alkyl, or R′OH; R2 represents hydrogen; —OH, C1-C5 alkoxy, or —OR′—OH; R′ represents: and, m is an integer from 1-5, n is 1 or 2 and p is 0 or 1.
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