发明授权
- 专利标题: Photosensitive resin composition
- 专利标题(中): 感光树脂组合物
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申请号: US09556528申请日: 2000-04-21
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公开(公告)号: US06280905B1公开(公告)日: 2001-08-28
- 发明人: Katsuo Koshimura , Tsukasa Toyoshima , Takashi Nishioka , Tadaaki Tanaka
- 申请人: Katsuo Koshimura , Tsukasa Toyoshima , Takashi Nishioka , Tadaaki Tanaka
- 优先权: JP11-114650 19990422
- 主分类号: G03F7032
- IPC分类号: G03F7032
摘要:
A photosensitive resin composition which comprises (1) a particulate copolymer comprising 10-99.8% by mole of the unit of (i) an aliphatic conjugated diene monomer, 0.1-30% by mole of the unit of (ii) a monomer having one polymerizable unsaturated group and an amino group, 0.1-20% by mole of the unit of (iii) a monomer having at least two polymerizable unsaturated groups and 0-40% by mole of the unit of (iv) a copolymerizable other monomer having one polymerizable unsaturated group, (2) a photopolymerizable unsaturated monomer and (3) a photopolymerization initiator typically represented by 9-fluorenone or 2-i-propylthioxanthone. A photosensitive resin composition is provided which can be developed by using water, has a low hardness and high resilience, and is excellent in balance of properties.
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