发明授权
- 专利标题： Photoresist polymers of carboxyl-containing alicyclic compounds
- 专利标题（中）： 含羧基脂环化合物的光致抗蚀剂聚合物
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申请号： US09302064申请日： 1999-04-29
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公开(公告)号： US06265130B1公开(公告)日： 2001-07-24
- 发明人: Geun Su Lee , Jae Chang Jung , Min Ho Jung , Cheol Kyu Bok , Ki Ho Baik
- 申请人： Geun Su Lee , Jae Chang Jung , Min Ho Jung , Cheol Kyu Bok , Ki Ho Baik
- 优先权： KR98-16223 19980430
- 主分类号： G03F7004
- IPC分类号： G03F7004
摘要：
The present invention relates to a carboxyl-containing alicyclic compound represented by Chemical Formula 1: wherein, R1 and R2, which may be identical to or different from each other, represent hydrogen or a tert-butyl group; X represents hydrogen, hydroxy or oxygen; and n represents a number from 1 to 3. Compounds of the present invention are useful as monomers in a photoresist resin, and in a process for preparing the same.
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