Invention Grant
US06252261B1 GaN crystal film, a group III element nitride semiconductor wafer and a manufacturing process therefor
有权
GaN晶体膜,III族元素氮化物半导体晶片及其制造方法
- Patent Title: GaN crystal film, a group III element nitride semiconductor wafer and a manufacturing process therefor
- Patent Title (中): GaN晶体膜,III族元素氮化物半导体晶片及其制造方法
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Application No.: US09342003Application Date: 1999-06-28
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Publication No.: US06252261B1Publication Date: 2001-06-26
- Inventor: Akira Usui , Akira Sakai , Haruo Sunakawa , Masashi Mizuta , Yoshishige Matsumoto
- Applicant: Akira Usui , Akira Sakai , Haruo Sunakawa , Masashi Mizuta , Yoshishige Matsumoto
- Priority: JP10-291354 19980930; JP11-122816 19990326
- Main IPC: H01L310328
- IPC: H01L310328

Abstract:
A GaN crystal film having a mask patterned in a stripe for forming multiple growing areas on a sapphire substrate and coalesced GaN crystals covering the mask dividing the areas, grown from the neighboring growing areas, comprising defects where multiple dislocations along with the stripe are substantially aligned with the normal line of the substrate, in the crystal areas over the mask, and dislocations propagating in substantially parallel with the substrate surface while, in the vicinity of the areas where the crystals are coalesced over the mask, propagating substantially in the normal line of the substrate surface, and a manufacturing process therefor. According to this invention, there can be provided a GaN crystal film in which strain, defects and dislocations are reduced and which tends not to generate cracks.
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