Invention Grant
US06252261B1 GaN crystal film, a group III element nitride semiconductor wafer and a manufacturing process therefor 有权
GaN晶体膜,III族元素氮化物半导体晶片及其制造方法

GaN crystal film, a group III element nitride semiconductor wafer and a manufacturing process therefor
Abstract:
A GaN crystal film having a mask patterned in a stripe for forming multiple growing areas on a sapphire substrate and coalesced GaN crystals covering the mask dividing the areas, grown from the neighboring growing areas, comprising defects where multiple dislocations along with the stripe are substantially aligned with the normal line of the substrate, in the crystal areas over the mask, and dislocations propagating in substantially parallel with the substrate surface while, in the vicinity of the areas where the crystals are coalesced over the mask, propagating substantially in the normal line of the substrate surface, and a manufacturing process therefor. According to this invention, there can be provided a GaN crystal film in which strain, defects and dislocations are reduced and which tends not to generate cracks.
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