Invention Grant
- Patent Title: Radiation-sensitive resin composition
- Patent Title (中): 辐射敏感树脂组合物
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Application No.: US09414724Application Date: 1999-10-08
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Publication No.: US06228554B1Publication Date: 2001-05-08
- Inventor: Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
- Applicant: Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
- Priority: JP60-173396 19850807
- Main IPC: G03F7023
- IPC: G03F7023

Abstract:
A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymono-carboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.
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