发明授权
- 专利标题: Method of forming a mirror in a waveguide
- 专利标题(中): 在波导中形成反射镜的方法
-
申请号: US831973申请日: 1997-04-02
-
公开(公告)号: US5902715A公开(公告)日: 1999-05-11
- 发明人: Koji Tsukamoto , Takeshi Ishitsuka , Tetsuzo Yoshimura , Katsusada Motoyoshi , Yasuhiro Yoneda
- 申请人: Koji Tsukamoto , Takeshi Ishitsuka , Tetsuzo Yoshimura , Katsusada Motoyoshi , Yasuhiro Yoneda
- 申请人地址: JPX Kawasaki
- 专利权人: Fujitsu Limited
- 当前专利权人: Fujitsu Limited
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX4-298920 19921109; JPX5-223723 19930908; JPX7-47604 19950307; JPX7-60770 19950320
- 主分类号: G02B6/12
- IPC分类号: G02B6/12 ; G02B6/255 ; G02B6/26 ; G02B6/42 ; G03C5/00 ; C03B37/023 ; G02B6/10
摘要:
A method of forming a mirror in a waveguide, including the steps of forming a layer constituting a waveguide in a substrate and forming a mirror-finished surface at a boundary between a portion irradiated with radiation and a non-irradiated portion by obliquely irradiating a layer constituting the waveguide with radiation. The waveguide may be composed of a photosensitive material, and either the irradiated area on the non-irradiated area may be removed by solvent. The waveguide may be composed of a refractive index imaging material in which a refractive index distribution is formed by irradiation with radiation or the refractive index may be increased by heating the irradiated portion. The refractive index imaging material may include a catalyzer to assist in increasing the refractive index distribution of the irradiated area.
公开/授权文献
- US5197199A Reflected spot sundial 公开/授权日:1993-03-30
信息查询