Invention Grant
- Patent Title: Method for manufacturing a semiconductor pressure sensor with single-crystal silicon diaphragm and single-crystal gage elements
- Patent Title (中): 制造具有单晶硅膜片和单晶计量元件的半导体压力传感器的方法
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Application No.: US462176Application Date: 1995-06-05
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Publication No.: US5672551APublication Date: 1997-09-30
- Inventor: Clifford D. Fung
- Applicant: Clifford D. Fung
- Applicant Address: MA Foxboro
- Assignee: The Foxboro Company
- Current Assignee: The Foxboro Company
- Current Assignee Address: MA Foxboro
- Main IPC: G01L9/00
- IPC: G01L9/00 ; H01L21/77
Abstract:
A semiconductor pressure sensor utilizes single-crystal silicon piezoresistive gage elements dielectrically isolated by silicon oxide from other such elements, and utilizes an etched silicon substrate with an etch stop. P-type implants form p-type piezoresistive gage elements and form p+ interconnections to connect the sensor to external electrical devices. The diaphragm is made from epitaxially-grown single-crystal silicon. Passivation nitride can be used for additional dielectric isolation. One practice of the invention provides over-range cavity protection, and thus increased robustness, by forming an over-range stop for the diaphragm through localized oxygen ion implantation and etching.
Public/Granted literature
- US5012745A Vehicle turn-table Public/Granted day:1991-05-07
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