发明授权
- 专利标题: Catadioptric reduction projection optical system
- 专利标题(中): 反射折射减光投影光学系统
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申请号: US456624申请日: 1995-06-01
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公开(公告)号: US5668673A公开(公告)日: 1997-09-16
- 发明人: Yutaka Suenaga , Toshiro Ishiyama , Yoshiyuki Shimizu , Kiyoshi Hayashi
- 申请人: Yutaka Suenaga , Toshiro Ishiyama , Yoshiyuki Shimizu , Kiyoshi Hayashi
- 申请人地址: JPX Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX3-195500 19910805; JPX4-202359 19920729; JPX4-343976 19921224; JPX5-286516 19931116; JPX6-155799 19940707
- 主分类号: G02B17/08
- IPC分类号: G02B17/08 ; G03F7/20 ; G02B17/00 ; G02B21/00
摘要:
A first partial optical system including a first group of lenses having a positive refractive power, a first concave reflection mirror and a second group of lenses having a positive refractive power, for forming a primary reduced image of an object, a second partial optical system including a second concave reelection mirror and a third group of lenses having a positive refractive power, for further reducing the primary reduced image and refocusing it, and a reflection mirror arranged between the first partial optical system and the second partial optical system, for deflecting a light path are arranged in a sequence as viewed from the object. A good image-forming ability as a projection optical system for fabricating a semiconductor device is attained with a simple construction.
公开/授权文献
- US4983495A Positive resist patterns 公开/授权日:1991-01-08
信息查询
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |
G02B17/08 | .折反射系统 |