发明授权
- 专利标题： Scanning exposure apparatus and method including controlling irradiation timing of an irradiation beam with respect to relative movement between the beam and a substrate
- 专利标题（中）： 扫描曝光装置和方法包括控制照射光束相对于光束和基底之间的相对移动的照射定时
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申请号： US280823申请日： 1994-07-26
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公开(公告)号： US5567928A公开(公告)日： 1996-10-22
- 发明人: Naoto Sano
- 申请人： Naoto Sano
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX5-183963 19930726
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01L21/027 ; G01J1/32
摘要：
A scanning type exposure apparatus includes an irradiation source for irradiating an irradiation beam, which has an intensity fluctuation upon a start of irradiation; a scanner for imparting relative movement between the irradiation beam and a mask and a substrate to be exposed to a pattern of the mask, wherein the relative movement starts before a start of illumination of the mask with the irradiation beam; and a controller for controlling the irradiation source to start emission of the irradiation beam before a start of the relative movement and a start of the illumination to reduce intensity fluctuation of the irradiation beam.
公开/授权文献
- US6100660A Current supply controller for an electric motor 公开/授权日：2000-08-08
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