发明授权
- 专利标题： Method for parallel multiple field processing in X-ray lithography
- 专利标题（中）： X射线光刻平行多场处理方法
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申请号： US398191申请日： 1995-03-02
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公开(公告)号： US5548625A公开(公告)日： 1996-08-20
- 发明人: Whitson G. Waldo, III
- 申请人： Whitson G. Waldo, III
- 申请人地址： IL Schaumburg
- 专利权人： Motorola, Inc.
- 当前专利权人： Motorola, Inc.
- 当前专利权人地址： IL Schaumburg
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F7/213 ; G21K1/02 ; H01L21/027 ; G21K5/00 ; G21K1/04
摘要：
A method for performing multiple field parallel processing in x-ray lithography uses a coupled mirror assembly (30) and a coupled mask assembly (22) to define and print multiple fields (54 & 54') in one step. The coupled mirror assembly (30) has multiple mirrored surfaces (34). The coupled mask assembly (22) has as many masks (44) as there are mirrored surfaces (34). The number of masks in the mask assembly define the number image fields that can be printed in parallel during a single exposure step. Thus, the overall cycle time for lithographically exposing an entire semiconductor wafer surface is inversely proportional to the number of parallel image fields.
公开/授权文献
- US4995106A Fast decision feedback decoder for digital data 公开/授权日：1991-02-19
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