Invention Grant
US5506152A Method of making silicon controlled rectifier with a variable base-shunt
resistance
失效
制造具有可变基极分流电阻的可控硅整流器的方法
- Patent Title: Method of making silicon controlled rectifier with a variable base-shunt resistance
- Patent Title (中): 制造具有可变基极分流电阻的可控硅整流器的方法
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Application No.: US299717Application Date: 1994-09-01
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Publication No.: US5506152APublication Date: 1996-04-09
- Inventor: David Whitney
- Applicant: David Whitney
- Applicant Address: NJ Iselin
- Assignee: Siemens Components, Inc.
- Current Assignee: Siemens Components, Inc.
- Current Assignee Address: NJ Iselin
- Main IPC: H01L31/111
- IPC: H01L31/111 ; H01L49/00
Abstract:
An optically triggered silicon controlled rectifier (SCR) circuit (20) has a number of semiconductor layers diffused into an N- substrate (21). The layers form an SCR (50) having a P+ anode region (25), a P+ gate region (24), and an N+ cathode region (27). An adjustable base-shunt resistance, in the form of a P- channel depletion mode MOSFET (Q3), connects between the SCR gate region and the cathode region. The MOSFET includes a MOSFET gate region (35), a P+ drain region (24), a P-- channel (26), and a P+ source region (23). The substrate also accommodates a PN photodiode (22, D1) which connects to the MOSFET gate region for switching the MOSFET on and off in response to incident optical radiation (L) thereon. The SCR gate region also comprises photosensitive material. When sufficient optical radiation illuminates the photodiode and the SCR gate region, the MOSFET is turned off and the SCR is triggered, permitting anode-to-cathode current to flow. When insufficient optical radiation is present, the MOSFET is turned on and provides a low-resistance shunt path which prevents the SCR gate region from triggering the SCR.
Public/Granted literature
- USD316252S Portable computer or similar article Public/Granted day:1991-04-16
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