发明授权
US5495515A Method and apparatus for producing high-intensity X-rays or .gamma.-rays
失效
用于生产高强度X射线或γ射线的方法和装置
- 专利标题: Method and apparatus for producing high-intensity X-rays or .gamma.-rays
- 专利标题(中): 用于生产高强度X射线或γ射线的方法和装置
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申请号: US220874申请日: 1994-03-31
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公开(公告)号: US5495515A公开(公告)日: 1996-02-27
- 发明人: Kazuo Imasaki
- 申请人: Kazuo Imasaki
- 申请人地址: JPX Osaka
- 专利权人: Institute for Laser Technology
- 当前专利权人: Institute for Laser Technology
- 当前专利权人地址: JPX Osaka
- 优先权: JPX5-205355 19930819; JPX6-048641 19940318
- 主分类号: G21K5/02
- IPC分类号: G21K5/02 ; H01L21/027 ; H01S3/00 ; H01S3/0959 ; H05G2/00 ; H01J35/14
摘要:
A method and apparatus for producing high-intensity X-rays or .gamma.-rays by accumulating a laser beam in an optical resonator having ultra-high reflectivity mirrors. With this arrangement, it is possible to produce powerful X-rays or .gamma.-rays even if the laser beam used is not powerful enough. A laser beam from a laser is injected into an optical resonator and accumulated therein. The optical resonator has an opposed pair of mirrors having a reflectivity of more than 0.999%. An electron beam may be introduced obliquely into the optical resonator and collided against the laser beam. In the interaction area thus created, X-rays or .gamma.-rays are produced due to the Compton scattering and propagated out of the optical resonator.
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