Invention Grant
- Patent Title: Process for fabricating a Josephson device
- Patent Title (中): 制造约瑟夫逊装置的工艺
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Application No.: US205357Application Date: 1994-03-03
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Publication No.: US5401530APublication Date: 1995-03-28
- Inventor: Itsuro Tamura , Satoshi Fujita , Masao Wada
- Applicant: Itsuro Tamura , Satoshi Fujita , Masao Wada
- Applicant Address: JPX Osaka
- Assignee: Osaka Gas Company, Ltd.
- Current Assignee: Osaka Gas Company, Ltd.
- Current Assignee Address: JPX Osaka
- Main IPC: H01L39/02
- IPC: H01L39/02 ; H01L39/00
Abstract:
A process for producing a Josephson device is disclosed, wherein a Josephson junction is formed over a recess step by oblique deposition and a protective layer of conducting material or semiconducting material is formed on the Josephson junction. The actual thickness of the Josephson junction is controlled to be smaller due to the proximity effect.
Public/Granted literature
- US6166737A Quick input device for window selection list control signal of notebook-type computer Public/Granted day:2000-12-26
Information query
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