发明授权
US5360485A Apparatus for diamond deposition by microwave plasma-assisted CVPD
失效
通过微波等离子体辅助CVPD进行金刚石沉积的装置
- 专利标题： Apparatus for diamond deposition by microwave plasma-assisted CVPD
- 专利标题（中）： 通过微波等离子体辅助CVPD进行金刚石沉积的装置
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申请号： US911693申请日： 1992-07-10
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公开(公告)号： US5360485A公开(公告)日： 1994-11-01
- 发明人: Pierre Bou , Lionel Vandenbulcke , Alain Quilgars , Michel Coulon , Michel Moisan
- 申请人： Pierre Bou , Lionel Vandenbulcke , Alain Quilgars , Michel Coulon , Michel Moisan
- 申请人地址： FRX Courbevoie
- 专利权人： Pechiney Recherche
- 当前专利权人： Pechiney Recherche
- 当前专利权人地址： FRX Courbevoie
- 优先权： FRX9109552 19910712
- 主分类号： C23C16/27
- IPC分类号： C23C16/27 ; C23C16/511 ; H01J37/32 ; C23C16/50
摘要：
Apparatus for depositing diamond on a substrate assisted by microwave plasma, comprising two zones, a plasma formation zone located in a waveguide and a diamond deposition zone located outside the waveguide. The apparatus includes means making it possible to form a stable plasma in the deposition zone, so as to considerably increase the substrate surface which can be treated.
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