发明授权
- 专利标题： Process control apparatus and method for adjustment of operating parameters of controller of the process control apparatus
- 专利标题（中）： 用于调整过程控制装置的控制器的工作参数的过程控制装置和方法
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申请号： US435911申请日： 1990-03-20
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公开(公告)号： US5245528A公开(公告)日： 1993-09-14
- 发明人: Tadayoshi Saito , Kohji Tachibana , Susumu Takahashi , Nobuyuki Yokokawa , Masahide Nomura , Hiroshi Matsumoto , Makoto Shimoda , Hisanori Miyagaki , Eiji Tohyama
- 申请人： Tadayoshi Saito , Kohji Tachibana , Susumu Takahashi , Nobuyuki Yokokawa , Masahide Nomura , Hiroshi Matsumoto , Makoto Shimoda , Hisanori Miyagaki , Eiji Tohyama
- 申请人地址： JPX Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX1-67983 19890320; JPX1-78249 19890331; JPX1-217365 19890825; JPX1-231605 19890908
- 主分类号： G05B13/02
- IPC分类号： G05B13/02
摘要：
A process control apparatus and a process control system for observing the waveform of the deviation between a set point which controls the process in a control loop and the process controlled variable transmitted from the process so that the operating parameters are adjusted in accordance with a predetermined adjustment rule by using the deviation based upon the absolute value of a wave for every half cycle of the wave. Therefore, even if the process controlled variable is influenced, the area of the wave cannot be changed significantly. As a result, the operating parameters can be adjusted correctly, causing the process controlled variable to quickly coincide with the set point.
公开/授权文献
- US5572821A C-channel frame construction for a sign 公开/授权日：1996-11-12
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