发明授权
US5240808A Light-sensitive compositions containing photosensitive polymeric
compound having both photocross-linkable groups capable of
cycloaddition, and functional groups carrying P--OH bonds
失效
含有具有能够环加成的可光交联基团的感光性高分子化合物和携带P-OH键的官能团的感光性组合物
- 专利标题： Light-sensitive compositions containing photosensitive polymeric compound having both photocross-linkable groups capable of cycloaddition, and functional groups carrying P--OH bonds
- 专利标题（中）： 含有具有能够环加成的可光交联基团的感光性高分子化合物和携带P-OH键的官能团的感光性组合物
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申请号： US819581申请日： 1992-01-08
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公开(公告)号： US5240808A公开(公告)日： 1993-08-31
- 发明人: Keitaro Aoshima , Masanori Imai
- 申请人： Keitaro Aoshima , Masanori Imai
- 申请人地址： JPX Minami-ashigara
- 专利权人： Fuji Photo Film Co., Ltd.
- 当前专利权人： Fuji Photo Film Co., Ltd.
- 当前专利权人地址： JPX Minami-ashigara
- 优先权： JPX1-108290 19890427
- 主分类号： G03F7/027
- IPC分类号： G03F7/027 ; G03F7/038
摘要：
A light-sensitive composition which comprises at least one polymeric compound having both photocross-linkable groups and functional groups carrying P--OH bonds. The light-sensitive composition can effectively be employed for making lithographic printing plates, IC circuits and photomasks. The light-sensitive composition shows excellent practically acceptable developability with either of an aqueous alkali developer and an aqueous alkaline solution containing or free of organic substances such as organic solvents and/or surfacants. Moreover, when it is used to form PS plates, the resulting lithographic printing plates never cause background contamination and can provide a large number of good printed matters. The composition makes it possible to develop negative working PS plates with developers for positive working PS plates. Therefore, when both positive and negative working PS plates are processed, the use of the composition can save various troubles.
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