发明授权
US5236815A Class of masked stabilizers in photographic materials or developing
solutions
失效
摄影材料或开发解决方案中的屏蔽稳定剂类
- 专利标题: Class of masked stabilizers in photographic materials or developing solutions
- 专利标题(中): 摄影材料或开发解决方案中的屏蔽稳定剂类
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申请号: US923483申请日: 1992-08-03
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公开(公告)号: US5236815A公开(公告)日: 1993-08-17
- 发明人: Jean-Marie O. Dewanckele , Richard A. Ooms , Marc B. Graindourze , Piet Kok
- 申请人: Jean-Marie O. Dewanckele , Richard A. Ooms , Marc B. Graindourze , Piet Kok
- 申请人地址: BEX Mortsel
- 专利权人: Agfa-Gevaert, N.V.
- 当前专利权人: Agfa-Gevaert, N.V.
- 当前专利权人地址: BEX Mortsel
- 优先权: EPX91202073.2 19910813
- 主分类号: G03C5/29
- IPC分类号: G03C5/29 ; C07D209/08 ; C07D231/56 ; C07D249/18 ; G03C1/06 ; G03C1/34 ; G03C1/485 ; G03C1/76 ; G03C5/305
摘要:
A new class of photographic masked stabilizers is disclosed showing following general chemical formula (Ia) or (Ib): ##STR1## wherein X and Y each independently represent N or CR, R being hydrogen or lower alkyl,Z represents a lower alkyl group, a nitro group, a halogen atom or hydrogen, andM represents a positive counterion, preferably an alkali cation, ammonium or substituted ammonium.The compounds are demasked by hydrolysis under alkaline conditions. They can be incorporated in a developing solution or in a photographic material, preferably in the backing layer. They show an enhanced solvability in water compared to the corresponding unmasked stabilizers.A preferred compound is 1-(2-sulphonatobenzoyl)-5-nitroindazole trimethylamine, sodium or potassium salt.
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