Invention Grant
- Patent Title: Reliable AlInGaAs/AlGaAs strained-layer diode lasers
- Patent Title (中): 可靠的ALINGAAS / ALGAAS应变层二极管激光器
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Application No.: US579347Application Date: 1990-09-07
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Publication No.: US5216684APublication Date: 1993-06-01
- Inventor: Christine A. Wang , James N. Walpole , Hong K. Choi , Joseph P. Donnelly
- Applicant: Christine A. Wang , James N. Walpole , Hong K. Choi , Joseph P. Donnelly
- Applicant Address: MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: MA Cambridge
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/30 ; H01S5/20 ; H01S5/343
Abstract:
A strained quantum-well diode laser with an AlInGaAs active layer and AlGaAs cladding and/or confining layers on a GaAs substrate is provided. AlInGaAs/AlGaAs lasers can be configured in laser geometries including ridge, waveguide, buried heterostructure, oxide-defined, proton-defined, narrow-stripe, broad-stripe, coupled-stripe and linear arrays using any epitaxial growth technique. Broad-stripe devices were fabricated in graded-index separate confinement heterostructures, grown by organometallic vapor phase epitaxy on GaAs substrates, containing a single Al.sub.y In.sub.x Ga.sub.l-x-y As quantum well with x between 0.14 and 0.12 and y between 0.05 and 0.17. With increasing Al content, emission wavelengths from 890 to 785 nm were obtained. Threshold current densities, J.sub.th 's, less than 200 A cm.sup.-2 and differential quantum efficiencies in the range 71 to 88 percent were observed.
Public/Granted literature
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