发明授权
- 专利标题: Light-sensitive photopolymerizable composition containing polymer with ethylenic unsaturation in the side chain
- 专利标题(中): 含有聚合物的光敏光聚合组合物在侧链中具有乙烯不饱和度
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申请号: US729898申请日: 1991-07-15
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公开(公告)号: US5153095A公开(公告)日: 1992-10-06
- 发明人: Kouichi Kawamura , Hiromichi Sano , Masanori Imai
- 申请人: Kouichi Kawamura , Hiromichi Sano , Masanori Imai
- 申请人地址: JPX Minami-Ashigara
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Minami-Ashigara
- 优先权: JPX63-237292 19880921
- 主分类号: G03F7/027
- IPC分类号: G03F7/027 ; G03F7/00 ; G03F7/033 ; G03F7/038
摘要:
A light-sensitive composition comprises (A) a polymer comprising structural units represented by the following general formula (I): ##STR1## (wherein R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 represents a hydrogen atom, an alkyl group or an aryl group; and Z represents a bivalent connecting group having at least 3 non-metallic atoms in the main chain); (B) a monomer or an oligomer having at least two polymerizable ethylenically unsaturatred double bonds; and (C) a photopolymerization initiator. The light-sensitive composition has high sensitivity and is excellent in stability of sensitivities such as storage stability, temperature dependency and latent image sensitization.
公开/授权文献
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