发明授权
- 专利标题: Thick film drawing apparatus
- 专利标题(中): 厚膜拉伸装置
-
申请号: US498452申请日: 1990-03-20
-
公开(公告)号: US5080036A公开(公告)日: 1992-01-14
- 发明人: Akira Kabeshita , Kazuhiro Mori
- 申请人: Akira Kabeshita , Kazuhiro Mori
- 申请人地址: JPX Kadoma
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JPX Kadoma
- 主分类号: B05C13/02
- IPC分类号: B05C13/02 ; H05K3/12
摘要:
A thick film drawing apparatus includes a substrate holding member (50) for holding a substrate (a), moving coils (60) for holding the substrate holding member (50), a drawing head (20) having a nozzle (30) and a stylus (33) for emitting pastes for drawing on a surface of the substrate (a) moving thereon and pushing the substrate (a) downward, respectively, wherein in the drawing process the drawing head (20) is locked of up/down motions and the substrate holding member (50) is raised/lowered at substantially constant weaker force by the moving coils (60), and thereby a relative-moving response of the up/down directions of the nozzle (30) is improved and a contact force of the stylus (33) on the substrate (a) is kept under a predetermined constant value, therefore a thickness of thick film line (c) is kept uniform and circuit patterns are prevented from being flawed.
公开/授权文献
信息查询