发明授权
- 专利标题： Device and process for treating fine particles
- 专利标题（中）： 用于处理细颗粒的装置和方法
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申请号： US443862申请日： 1989-11-30
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公开(公告)号： US4991541A公开(公告)日： 1991-02-12
- 发明人: Hiroyuki Sugata , Masao Sugata , Noriko Kurihara , Tohru Den , Kenji Ando , Osamu Kamiya
- 申请人： Hiroyuki Sugata , Masao Sugata , Noriko Kurihara , Tohru Den , Kenji Ando , Osamu Kamiya
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX61-224929 19860925
- 主分类号： C23C14/24
- IPC分类号： C23C14/24 ; B01J4/00 ; B01J12/00 ; B01J12/02 ; B01J19/08 ; B22F1/00 ; B22F1/02 ; B22F9/12 ; C23C16/48 ; C23C16/54
摘要：
A device for treating fine particles is provided which comprises a plural number of reaction chambers for providing reaction fields different from each other provided along the flow pathway on the downstream side of a nozzle which jets out fine particles in a beam. The device may be provided with a chamber for a starting material for forming fine particles. The nozzle may be a convergent-divergent nozzle.
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