发明授权
- 专利标题: Vacuum handling apparatus
- 专利标题(中): 真空处理设备
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申请号: US515573申请日: 1983-07-20
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公开(公告)号: US4496180A公开(公告)日: 1985-01-29
- 发明人: Joseph T. Hillman , Michael B. Miller
- 申请人: Joseph T. Hillman , Michael B. Miller
- 申请人地址: OH Cincinnati
- 专利权人: Cincinnati Milacron Industries, Inc.
- 当前专利权人: Cincinnati Milacron Industries, Inc.
- 当前专利权人地址: OH Cincinnati
- 主分类号: B65G47/91
- IPC分类号: B65G47/91 ; H01L21/683 ; B66C1/02
摘要:
A vacuum operated apparatus is provided for releasably grasping and transporting a thin solid object or article (e.g. silicon semiconductor wafer). The apparatus has two fixed rigid arms joined together at their rear end to define a gap therebetween having an open end and closed end wherein the upper arm directs the thin solid object into the gap and toward the lower arm having a port communicating with the gap and an enclosed passage way connected to a vacuum source. A vacuum applied to the lower arm holds the object against the grasping surface of the lower arm. Silicon semiconductor wafers may be grasped and transported with the apparatus and more especially silicon semiconductor wafers can be deposited onto and removed from the surface of a barrel type susceptor of an epitaxial reactor with enhanced ease and reduced danger of scratching and breaking the wafer.
公开/授权文献
- US5007489A Drilling fluid methods and composition 公开/授权日:1991-04-16
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