发明授权
US4421841A Photosensitive lithographic plate with sulfonate containing photosensitive polyester 失效
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Photosensitive lithographic plate with sulfonate containing
photosensitive polyester
摘要:
A photosensitive lithographic plate having, on a substrate, a photosensitive layer comprising a photosensitive polyester containing at least (A):(a) an aromatic dicarboxylic acid unit represented by the general formula: ##STR1## where m and n each represents an integer of 0 or 1, with at least one of them being 1,(b) a dicarboxylic acid unit having a sulfonate group, and(c) a diol unit represented by the general formula: ##STR2## represents a hydrogenated benzene ring, R.sup.1 and R.sup.2 each represents an alkylene group of 2-4 carbon atoms, R.sup.3 and R.sup.4 each represents a hydrogen atom or an alkyl group of 1-6 carbon atoms, r and s each represents an integer of from 0 to 3 and t represents an integer of 0 or 1.
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