发明授权
- 专利标题: Photosensitive lithographic plate with sulfonate containing photosensitive polyester
- 专利标题(中): 含感光性聚酯的光敏平版印刷版
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申请号: US398442申请日: 1982-07-14
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公开(公告)号: US4421841A公开(公告)日: 1983-12-20
- 发明人: Shigeki Shimizu , Akinobu Oshima
- 申请人: Shigeki Shimizu , Akinobu Oshima
- 申请人地址: JPX Tokyo
- 专利权人: Mitsubishi Chemical Industries Limited
- 当前专利权人: Mitsubishi Chemical Industries Limited
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX56-118345 19810728; JPX57-56183 19820405
- 主分类号: C08G63/688
- IPC分类号: C08G63/688 ; G03F7/032 ; G03F7/038 ; G03C1/68 ; C08G18/00 ; C08G63/00 ; C08G69/00
摘要:
A photosensitive lithographic plate having, on a substrate, a photosensitive layer comprising a photosensitive polyester containing at least (A):(a) an aromatic dicarboxylic acid unit represented by the general formula: ##STR1## where m and n each represents an integer of 0 or 1, with at least one of them being 1,(b) a dicarboxylic acid unit having a sulfonate group, and(c) a diol unit represented by the general formula: ##STR2## represents a hydrogenated benzene ring, R.sup.1 and R.sup.2 each represents an alkylene group of 2-4 carbon atoms, R.sup.3 and R.sup.4 each represents a hydrogen atom or an alkyl group of 1-6 carbon atoms, r and s each represents an integer of from 0 to 3 and t represents an integer of 0 or 1.
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