发明授权
- 专利标题: Direct positive silver halide light-sensitive material
- 专利标题(中): 直接正卤化银感光材料
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申请号: US026962申请日: 1979-04-04
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公开(公告)号: US4255511A公开(公告)日: 1981-03-10
- 发明人: Shigeo Hirano , Keiichi Adachi , Nobuyuki Tsujino
- 申请人: Shigeo Hirano , Keiichi Adachi , Nobuyuki Tsujino
- 申请人地址: JPX Ashigara
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Ashigara
- 优先权: JPX53/40621 19780406
- 主分类号: C07C67/00
- IPC分类号: C07C67/00 ; C07C325/00 ; C07C335/04 ; G03C1/485 ; G03C8/08 ; G03C1/06 ; G03C1/36 ; G03C1/76 ; G03C7/00
摘要:
A direct positive light-sensitive silver halide photographic material comprising a support having thereon a layer containing a compound represented by the formula (I): ##STR1## wherein R.sub.1 represents an aliphatic residue or an aromatic residue; R.sub.2 represents a hydrogen atom, an aliphatic residue, or an aromatic residue; X.sub.1 and X.sub.2, which may be the same or different, each represents a divalent aromatic residue; and Y represents --R--, --O--R or --S--R-- wherein R represents a divalent aliphatic residue and the O or S is bonded to X.sub.1. The compound is particularly effective in combination with a diffusible dye releasing dye image providing compound having an o-hydroxyarylsulfamoyl group.
公开/授权文献
- US6013395A Photomask for use in exposure and method for producing same 公开/授权日:2000-01-11
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