发明授权
US4245231A Combination capacitor and transistor structure for use in monolithic circuits 失效
组合电容器和晶体管结构用于单片电路

  • 专利标题: Combination capacitor and transistor structure for use in monolithic circuits
  • 专利标题(中): 组合电容器和晶体管结构用于单片电路
  • 申请号: US973407
    申请日: 1978-12-26
  • 公开(公告)号: US4245231A
    公开(公告)日: 1981-01-13
  • 发明人: Robert B. Davies
  • 申请人: Robert B. Davies
  • 申请人地址: IL Schaumburg
  • 专利权人: Motorola Inc.
  • 当前专利权人: Motorola Inc.
  • 当前专利权人地址: IL Schaumburg
  • 主分类号: H01L27/07
  • IPC分类号: H01L27/07 H03F3/30 H01L27/02
Combination capacitor and transistor structure for use in monolithic
circuits
摘要:
A combination capacitor and transistor structure is described wherein the capacitor is formed integrally with the emitter electrode of the transistor. The transistor is formed in a monolithic integrated circuit using generally known techniques and constitutes a vertically integrated PNP device. The emitter electrode of the transistor which comprises a P+ diffusion region is of a predetermined area which is large enough to form the bottom plate of the capacitor. The top plate of the capacitor is formed by growing a dielectric material over the diffused emitter region and then forming metallization thereover. The combination capacitor and transistor structure may be utilized in a bias network for biasing the output stage of an operational amplifier in a class AB mode. The capacitor formed in the combination structure may be utilized as the compensation capacitor in such operational amplifier which utilizes pole splitting techniques. The improvement provided by the invention reduces the surface area of the semiconductor die chip required to form the capacitor and transistor which facilitates greater device density on a particular die chip.
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