Invention Application
- Patent Title: PLASMA COATING METHOD OF NANOVESICLE SURFACE AND PLASMA JET DEVICE FOR PLASMA COATING OF NANOVESICLE SURFACE
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Application No.: US18762860Application Date: 2024-07-03
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Publication No.: US20250009661A1Publication Date: 2025-01-09
- Inventor: Ana Sofia PEREIRA DE BRITO , Byeong Moon KWAK , Bum Ho BIN , Hyo Jin HEO , Byung Sun CHA , So Min LEE , So Young JUNG , Lei LEI , Sang Hun LEE , Byung Mook WEON
- Applicant: Research & Business Foundation SUNGKYUNKWAN UNIVERSITY , AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
- Applicant Address: KR Suwon-si; KR Suwon-si
- Assignee: Research & Business Foundation SUNGKYUNKWAN UNIVERSITY,AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
- Current Assignee: Research & Business Foundation SUNGKYUNKWAN UNIVERSITY,AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
- Current Assignee Address: KR Suwon-si; KR Suwon-si
- Priority: KR10-2023-0086012 20230703
- Main IPC: A61K9/127
- IPC: A61K9/127 ; B01J19/08

Abstract:
An embodiment of the disclosure provides a plasma coating method of a nanovesicle surface and a plasma jet device for plasma coating of a nanovesicle surface. The plasma coating method of a nanovesicle surface according to an embodiment of the disclosure may be provided as a simple method for changing the surface charge of a nanovesicle from negative to neutral by utilizing the characteristic that when a neutral object meets a negatively charged object, electrons of the neutral object repel electrons of the negatively charged object and the negatively charged object becomes positively charged.
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