Invention Application
- Patent Title: STRUCTURE OF A MASK
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Application No.: US18740949Application Date: 2024-06-12
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Publication No.: US20240417046A1Publication Date: 2024-12-19
- Inventor: Heng-Ea SHIUE
- Applicant: QBAS Co., Ltd.
- Applicant Address: TW Taipei City
- Assignee: QBAS Co., Ltd.
- Current Assignee: QBAS Co., Ltd.
- Current Assignee Address: TW Taipei City
- Main IPC: B63C11/12
- IPC: B63C11/12 ; A63B33/00

Abstract:
A structure of a mask (1) is provided. The structure includes a frame (10), a viewing window assembly (20), and a waterproof skirt assembly (30). The face portion (32) of the waterproof skirt assembly has a circumferential contact area (33). The face portion has a first shape and is made of a material that includes a re-moldable material. When a user (U) puts on the mask through a fastening device (40), the face portion is adapted to be squeezed and deformed to be in a second shape by the user's face, whereby making the circumferential contact area be capable of further following the contour of the user's face; whereas when the user takes off the mask, the face portion remains in the second shape.
Information query