- 专利标题: CELL CULTURE METHOD AND MASKING SHEET
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申请号: US18764172申请日: 2024-07-04
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公开(公告)号: US20240360407A1公开(公告)日: 2024-10-31
- 发明人: Yusuke KASAI , Takahiro OBA
- 申请人: FUJIFILM CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM CORPORATION
- 当前专利权人: FUJIFILM CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP 22015679 2022.02.03
- 主分类号: C12N5/00
- IPC分类号: C12N5/00 ; C12M1/00 ; C12M1/32
摘要:
There is provided a masking sheet that is used for patterning cells or cell aggregates, which are formed on a culture surface. The masking sheet has the adhesive layer that is adhered to a culture surface, the support layer that is laminated on the adhesive layer to support the adhesive layer, and the opening portion that penetrates through the adhesive layer and the support layer and corresponds to a pattern of the cells or cell aggregates.
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