- 专利标题: FILM HAVING METHACRYLIC ACID ESTER-BASED RESIN AS MAIN COMPONENT
-
申请号: US18293470申请日: 2022-07-19
-
公开(公告)号: US20240343899A1公开(公告)日: 2024-10-17
- 发明人: Noriaki YASUMOTO , Yasushi MIYAMURA , Keiji TAKANO
- 申请人: DENKA COMPANY LIMITED
- 申请人地址: JP Tokyo
- 专利权人: DENKA COMPANY LIMITED
- 当前专利权人: DENKA COMPANY LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP 21130097 2021.08.06 JP 22063103 2022.04.05
- 国际申请: PCT/JP2022/028095 2022.07.19
- 进入国家日期: 2024-01-30
- 主分类号: C08L33/10
- IPC分类号: C08L33/10 ; B32B7/023 ; B32B27/08 ; B32B27/30 ; C08J5/18
摘要:
A resin film that has both high transparency and excellent blocking resistance including crosslinked (meth)acrylic acid ester-based resin particles includes methacrylic acid ester-based resin as a main component, wherein the crosslinked (meth)acrylic acid-based resin particles have an average particle diameter of 1% or more and 10% or less with respect to an average thickness of the film, wherein the film does not include vinylidene fluoride-based resin, wherein a haze of the film measured based on JIS K7136: 2000 is 5% or less, and wherein a clarity (CLR) of the film is 97% or more.
信息查询
IPC分类: