Invention Publication
- Patent Title: MERGED CAVITIES FOR CONDUCTOR FORMATION IN A MEMORY DIE
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Application No.: US18443013Application Date: 2024-02-15
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Publication No.: US20240284672A1Publication Date: 2024-08-22
- Inventor: David H. Wells , Matthew J. King , Indra V. Chary , Yoshiaki Fukuzumi , Lifang Xu , Paolo Tessariol , Shuangqiang Luo
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Main IPC: H10B43/27
- IPC: H10B43/27 ; H10B43/10

Abstract:
Methods, systems, and devices for merged cavities for conductor formation in a memory die are described. An array of cavities may be formed through a stack of material layers of a memory die, and conductors may be formed at least in part by merging some of the cavities of the array. Such cavities may be sized in accordance with a relatively smallest feature that implements a subset of such cavities, and a smallest associated feature may be formed using a first subset of the array of cavities. Conductors may be formed at least in part by merging two or more cavities of a second subset of the array of cavities using a material removal operation to remove portions of the stack of material layers. Such merging may support conductors being formed with a cross-section that is greater than a cross-section of other features formed using such cavities that are not merged.
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