Invention Publication
- Patent Title: SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
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Application No.: US18323323Application Date: 2023-05-24
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Publication No.: US20240258391A1Publication Date: 2024-08-01
- Inventor: Rho Gyu KWAK , In Su PARK , Jung Shik JANG , Jung Dal CHOI , Seok Min CHOI , Won Geun CHOI
- Applicant: SK hynix Inc.
- Applicant Address: KR Icheon-si Gyeonggi-do
- Assignee: SK hynix Inc.
- Current Assignee: SK hynix Inc.
- Current Assignee Address: KR Icheon-si Gyeonggi-do
- Priority: KR 20230010283 2023.01.26
- Main IPC: H01L29/423
- IPC: H01L29/423 ; H01L23/528 ; H01L23/532

Abstract:
A semiconductor device according to an embodiment of the present disclosure includes a first cell area and a second cell area adjacent to each other in a first direction, a support disposed between the first cell area and the second cell area, first gate lines stacked in the first cell area, first pads configured to extend from the first gate lines and configured to protrude upward along a first sidewall of the support, second gate lines stacked in the second cell area, second pads configured to extend from the second gate lines and configured to protrude upward along a second sidewall of the support, and first connection pads configured to extend in the first direction along a third sidewall of the support and configured to electrically connect the first pads with the second pads.
Information query
IPC分类: