- 专利标题: CRUCIFORM BONDING STRUCTURE FOR 3D-IC
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申请号: US18149789申请日: 2023-01-04
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公开(公告)号: US20240128216A1公开(公告)日: 2024-04-18
- 发明人: Hao-Lin Yang , Kuan-Chieh Huang , Wei-Cheng Hsu , Tzu-Jui Wang , Ching-Chun Wang , Hsiao-Hui Tseng , Chen-Jong Wang , Dun-Nian Yaung
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 主分类号: H01L23/00
- IPC分类号: H01L23/00 ; H01L23/522 ; H01L25/065
摘要:
A bonding structure that may be used to form 3D-IC devices is formed using first oblong bonding pads on a first substrate and second oblong bonding pads one a second substrate. The first and second oblong bonding pads are laid crosswise, and the bond is formed. Viewed in a first cross-section, the first bonding pad is wider than the second bonding pad. Viewed in a second cross-section at a right angle to the first, the second bonding pad is wider than the first bonding pad. Making the bonding pads oblong and angling them relative to one another reduces variations in bonding area due to shifts in alignment between the first substrate and the second substrate. The oblong shape in a suitable orientation may also be used to reduce capacitive coupling between one of the bonding pads and nearby wires.
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