- 专利标题: HYBRID MANUFACTURING OF ACCESS TRANSISTORS FOR MEMORY
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申请号: US17933589申请日: 2022-09-20
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公开(公告)号: US20240098965A1公开(公告)日: 2024-03-21
- 发明人: Abhishek A. Sharma , Tahir Ghani , Wilfred Gomes , Anand S. Murthy , Pushkar Sharad Ranade , Sagar Suthram
- 申请人: Intel Corporation
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 主分类号: H01L27/108
- IPC分类号: H01L27/108 ; G11C5/06 ; G11C5/10 ; H01L23/48 ; H01L25/065 ; H01L27/11507 ; H01L27/11509 ; H01L27/11514
摘要:
Hybrid manufacturing of access transistors for memory, presented herein, explores how IC components fabricated by different manufacturers may be combined in an IC device to achieve advantages in terms of, e.g., performance, density, number of active memory layers, fabrication approaches, and so on. In one aspect, an IC device may include a support, a first circuit over a first portion of the support, a second circuit over a second portion of the support, a scribe line between the first circuit and the second circuit, and one or more electrical traces extending over the scribe line. In another aspect, an IC device may include a support, a memory array, comprising a first circuit over a first portion of the support and one or more layers of capacitors over the first circuit, and a second circuit over a second portion of the support.
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