Invention Publication
- Patent Title: LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF
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Application No.: US18269191Application Date: 2021-12-02
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Publication No.: US20240036485A1Publication Date: 2024-02-01
- Inventor: Arjan Johannes Anton BEUKMAN , Sebastianus Adrianus GOORDEN , Stephen ROUX , Sergel SOKOLOV , Filippo ALPEGGIANI
- Applicant: ASML Netheriands B. V. , ASML Holding N.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netheriands B. V.,ASML Holding N.V.
- Current Assignee: ASML Netheriands B. V.,ASML Holding N.V.
- Current Assignee Address: NL Veldhoven; NL Veldhoven
- International Application: PCT/EP2021/084063 2021.12.02
- Date entered country: 2023-06-22
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03F7/00
Abstract:
A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.
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