Invention Application
- Patent Title: Wavelength Tracking System, Method to Calibrate a Wavelength Tracking System, Lithographic Apparatus, Method to Determine an Absolute Position of a Movable Object, and Interferometer System
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Application No.: US18048119Application Date: 2022-10-20
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Publication No.: US20230056872A1Publication Date: 2023-02-23
- Inventor: Engelbertus Antonius Fransiscus VAN DER PASCH , Suzanne Johanna Antonetta Geertruda COSIJNS , Koen Govert Olivier VAN DE MEERAKKER , Ivo WIDDERSHOVEN
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP18154460.2 20180131,EP18197177.1 20180927
- Main IPC: G01J9/02
- IPC: G01J9/02 ; G01B11/00 ; G03F7/00 ; G03F7/20 ; G01B9/02001 ; G01B9/02002 ; G01B9/02015

Abstract:
The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receive the first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the first sensor signal and the second sensor signal.
Information query